Researcher Directory | Osaka City University


SHIRAFUJI Tatsuru

  • Department:Graduate School of Engineering Physical Electronics and Informatics (Applied Physics and Electronics) Position:Professor
  • Website:http://www.t-shirafuji.jp/
Last Updated:2017/04/29

Career

Professional Career

  • 1991-2001 Kyoto Institute of Technology
  • 2001-2009 Kyoto University
  • 2009-2010 Nagoya University
  • 2010- Osaka City University

Current Research Subjects

Current Research Subjects

  • Research Subject:Plasmas in Micro-scale Multi-phase Non-uniform media and Their Application
    Research Field:Plasma Science and Technology、Metallurgy and Material Processing、Chemical Engineering in General
    Keywords:microplasma、multi-phase media、non-uniform media
  • Research Subject:Study of Plasma Chemistry involving Liquid Media
    Research Field:Plasma Science and Technology、Metallurgy and Material Processing、Chemical Engineering in General
    Keywords:plasma、chemical reaction、liquid

Research Achievements

Books・Papers

  • Plasma copolymerization of C6F6/C5F8 for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ Fourier transform infrared spectroscopy
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2004/05
    Name of Publisher/Name of Journal:Jpn. J. Appl. Phys.
    Volume/Number,Page:43(5A):2697-2703
    Authors:T. Shirafuji, A. Tsuchino, T. Nakamura and K. Tachibana
  • Generation of plasmas in multiphase medium
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2010/03
    Name of Publisher/Name of Journal:Trans. Mater. Res. Soc. Jpn.
    Volume/Number,Page:35:81-83
    Authors:K. Tachibana and T. Shirafuji
  • Fourier-transform infrared phase-modulated ellipsometry for in situ diagnostics of plasma-surface interactions
    Type:Review
    by Single Author or Co-authored:Co-authored
    Date of Publication:2004/02
    Name of Publisher/Name of Journal:J. Phys. D. Appl. Phys.
    Volume/Number,Page:37:R49-R73
    Authors:T. Shirafuji, H. Motomura, H. J. Lee, K. Tachibana, S. Imai, W. W. Stoffels and G. M. W. Kroesen
  • Observation of self-organized filaments in a dielectric barrier discharge of Ar gas
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2003/09
    Name of Publisher/Name of Journal:Appl. Phys. Lett.
    Volume/Number,Page:83(12):2309-2311
    Authors:T. Shirafuji, T. Kitagawa, T. Wakai and K. Tachibana
  • Solution plasma surface modification for nanocarbon-composite materials
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2009/12
    Name of Publisher/Name of Journal:J. Jpn. Inst. Metals
    Volume/Number,Page:73(12):938-942
    Authors:J. Hieda, T. Shirafuji, Y. Noguchi, N. Saito and O. Takai
  • Measurement and calculation of SiH2 radical density in SiH4 and Si2H6 plasma for the deposition of hydrogenated amorphous silicon thin films
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:1994/07
    Name of Publisher/Name of Journal:Jpn. J. Appl. Phys.
    Volume/Number,Page:34(8A):4239-4246
    Authors:T. Shirafuji, K. Tachibana and Y. Matsui
  • Plasma copolymerization of tetrafluoroethylene / hexamethyldisiloxane and in situ Fourier transform infrared spectroscopy of its gas phase
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:1999/07
    Name of Publisher/Name of Journal:Jpn. J. Appl. Phys.
    Volume/Number,Page:38(7B):4520-4526
    Authors:T. Shirafuji, Y. Miyazaki, Y. Nakagami, Y. Hayashi and S. Nishino
  • Low-hydrogen-concentration a-Si:H deposited by direct photo-CVD
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:1991/08
    Name of Publisher/Name of Journal:Solar Energy Mater.
    Volume/Number,Page:23:256-264
    Authors:T. Shirafuji, M. Yoshimoto, T. Fuyuki and H. Matsunami
Display all
Books・Papersclose
  • Plasma copolymerization of C6F6/C5F8 for application of low-dielectric-constant fluorinated amorphous carbon films and its gas-phase diagnostics using in situ Fourier transform infrared spectroscopy
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2004/05
    Name of Publisher/Name of Journal:Jpn. J. Appl. Phys.
    Volume/Number,Page:43(5A):2697-2703
    Authors:T. Shirafuji, A. Tsuchino, T. Nakamura and K. Tachibana
  • Generation of plasmas in multiphase medium
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2010/03
    Name of Publisher/Name of Journal:Trans. Mater. Res. Soc. Jpn.
    Volume/Number,Page:35:81-83
    Authors:K. Tachibana and T. Shirafuji
  • Fourier-transform infrared phase-modulated ellipsometry for in situ diagnostics of plasma-surface interactions
    Type:Review
    by Single Author or Co-authored:Co-authored
    Date of Publication:2004/02
    Name of Publisher/Name of Journal:J. Phys. D. Appl. Phys.
    Volume/Number,Page:37:R49-R73
    Authors:T. Shirafuji, H. Motomura, H. J. Lee, K. Tachibana, S. Imai, W. W. Stoffels and G. M. W. Kroesen
  • Observation of self-organized filaments in a dielectric barrier discharge of Ar gas
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2003/09
    Name of Publisher/Name of Journal:Appl. Phys. Lett.
    Volume/Number,Page:83(12):2309-2311
    Authors:T. Shirafuji, T. Kitagawa, T. Wakai and K. Tachibana
  • Solution plasma surface modification for nanocarbon-composite materials
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:2009/12
    Name of Publisher/Name of Journal:J. Jpn. Inst. Metals
    Volume/Number,Page:73(12):938-942
    Authors:J. Hieda, T. Shirafuji, Y. Noguchi, N. Saito and O. Takai
  • Measurement and calculation of SiH2 radical density in SiH4 and Si2H6 plasma for the deposition of hydrogenated amorphous silicon thin films
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:1994/07
    Name of Publisher/Name of Journal:Jpn. J. Appl. Phys.
    Volume/Number,Page:34(8A):4239-4246
    Authors:T. Shirafuji, K. Tachibana and Y. Matsui
  • Plasma copolymerization of tetrafluoroethylene / hexamethyldisiloxane and in situ Fourier transform infrared spectroscopy of its gas phase
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:1999/07
    Name of Publisher/Name of Journal:Jpn. J. Appl. Phys.
    Volume/Number,Page:38(7B):4520-4526
    Authors:T. Shirafuji, Y. Miyazaki, Y. Nakagami, Y. Hayashi and S. Nishino
  • Low-hydrogen-concentration a-Si:H deposited by direct photo-CVD
    Type:Paper
    by Single Author or Co-authored:Co-authored
    Date of Publication:1991/08
    Name of Publisher/Name of Journal:Solar Energy Mater.
    Volume/Number,Page:23:256-264
    Authors:T. Shirafuji, M. Yoshimoto, T. Fuyuki and H. Matsunami

Industrial-Academic-Government Cooperation

Research Department

  • Graduate School of Engineering Physical Electronics and Informatics (Applied Physics and Electronics)

Current Research Subjects

  • Research Subject:Plasmas in Micro-scale Multi-phase Non-uniform media and Their Application
    Research Field:Plasma Science and Technology、Metallurgy and Material Processing、Chemical Engineering in General
    Keywords:microplasma、multi-phase media、non-uniform media
  • Research Subject:Study of Plasma Chemistry involving Liquid Media
    Research Field:Plasma Science and Technology、Metallurgy and Material Processing、Chemical Engineering in General
    Keywords:plasma、chemical reaction、liquid

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